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超快成膜REBCO中的柱状纳米级人工磁通钉扎
Release time：2024-10-10
通过靶材配方和沉积过程的精准调控，可获得分布态的柱状人工磁通钉扎
基于超快的薄膜沉积工艺，最快成膜速度可超过200 nm/s
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